We offer a variety of products for top level maskmaking, including software to correct placement error due to charging, simulate and optimize electron beam lithography, linearity and printability of features, resist heating, etc. Other products are used to understand and optimize metrology of masks. [more...]

The semiconductor industry says that "we can build it if we can measure it". SCATT product is used to simulate optical scatterometry in order to understand sensitivity of any specific method or system to process variation, especially for new chips to be built and their fabrication processes. [more...]