Order masks with feature sizes down to 1 µm

Top level maskmaking

Top Level Maskmaking

We have a variety of products for top level maskmaking, such as software to simulate and optimize electron beam lithography, including the linearity and printability of features, shot noise, resist heating, placement error due to charging. Other products are used to understand and optimize chrome etch and SEM metrology of masks, including charging.

We also have a variety of products to support electron beam lithography and dry etch processes for top level photolithography mask manufacturing.

Our customers are equipment makers and top-level maskmakers around the world.

Electron Beam Lithography

SEM metrology, electron beam lithography and e-beam defect inspection are indispensable parts of top level semiconductor manufacturing. Our products include simulation tools to understand and optimize electron interactions with materials, electron scattering, charging, heating, energy deposition, as well as electron trajectories inside solids and trajectories in complex electromagnetic fields. [more...]

Dry Etch

Understanding and optimizing dry etch, film deposition and other processes require a lot of effort. Modeling helps in understanding these processes. Our software simulates the dynamics of the etch profile, including such effects as trenching, footing, dispersion, and microloading. The profile, CDs and CD variation due to dry etch are simulated. The software can also handle complex processes such a double patterning, MEMS etch, etc. [more...]