CHARIOT

Screenshot of Chariot

CHARIOT is an advanced Monte Carlo software used to simulate signals and images in scanning electron microscopy (SEM). The absorbed dose and charging can be predicted in EBL. This software employs advanced physical and computational models to comply with the required accuracy, especially at low voltages. [more...]


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TRAVIT Dry Etch

Screenshot of TRAVIT Dry Etch

TRAVIT Dry Etch simulates plasma and wet etch. The software predicts etch profiles, CDs, and CD-variations for various patterns and processes, including microloading effects. This is the only software on dry etch in maskmaking; it can also be applied to wafer etch. [more...]




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myCD

myCD screenshot myCD software automatically extracts the contours of SEM images and analyzes them. The software uses advanced physics to determine top, bottom, and 50% CDs, as well as LER, LWR and sidewall angles. The analysis is based on an understanding of physical principles involved in the formation of the SEM signal. [more...]



References
Verification


BEAMETR

Beametr Pattern, 30 nm BEAMETR is a technique to automatically measure the electron-beam size. The product includes a piece of silicon with a fabricated nano-pattern, and the software. With BEAMETR, the operator scans the pattern, and then the software reads the image and determines the beam size using spatial frequency analysis of the pattern. [more...]


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TRAVIT EBL

TRAVIT EBL screenshot TRAVIT EBL software is used to simulate energy deposition and resist development in electron beam lithography.The model takes into account the resist characteristics, exposure parameters, layout, beam blur, diffusion length in the resist, 2D and 3D point spread functions, etc. [more...]




TEMPTATION

TEMPTATION TEMPTATION predicts temperature rises in electron beam lithography. Temperature variations lead to changes in resist sensitivity, and thus to variations in critical dimensions. This problem is especially important in maskmaking, where the substrate is of poor heat conductivity, as well as in direct write EBL, where the writing speed is extremely high. [more...]


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SCATT

Screenshot of SCATT

SCATT is a software tool used to simulate light scattering on microelectronic patterns. The software is based on the rigorous coupled wave analysis (RCWA) physical model.The software is equipment-independent and utilizes a user friendly 3D graphical user interface. [more...]




References

DISPLACE

DISPLACE DISPLACE software models charging and displacement of the electron beam due to charging effects on the target's surface. Exposure of the resist layer to a charged beam causes an injection of holes and electrons into the layer. DISPLACE uses advanced physical models to describe the dynamics of surface charging and beam deflection. [more...]



SEM Tools

XENOS XeDraw and XPG-2 are both pattern generators; they convert any SEM into a lithography system. Attached to a conventional SEM, focused ion-beam, or dual beam tool, they upgrade the system to perform nanolithography or MEMS fabrication. A beam blanker and a precision stage are also available that can be installed into the SEM without taking apart the column. [more...]


Pattern Generators
Stage
Beam blanker

Photomask

Photomasks

We offer low-priced, high quality photolitography masks with critical dimentions down to 1 micron. Masks from 4" to 32" in size can be manufactured.The order can be placed online. Verification before starting the production is available. High speed Micronic laser writers assure both low cost and high quality. Most masks are defect free masks. [more...]

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Nanoimprinted fresnel lens on a fiber

Fiber photonics

We offer high-quality photonics integrated into an optical fiber as a low-cost and easy-to-use solution for wavefront manipulation. Specific designs are optical elements on the fiber such as beam shapers, focusing lenses, and vortex faceplate. Designs and manufacturing of fiber optics up to customer?s specification is available. [more...]