 TRAVIT EBL software is used to simulate energy deposition and resist development in electron beam lithography.The model takes into account the resist characteristics, exposure parameters, layout, beam blur, diffusion length in the resist, 2D and 3D point spread functions, etc.
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 DISPLACE software models charging and displacement of the electron beam due to charging effects on the target's surface. Exposure of the resist layer to a charged beam causes an injection of holes and electrons into the layer. DISPLACE uses advanced physical models to describe the dynamics of surface charging and beam deflection.
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 TEMPTATION predicts temperature rises in electron beam lithography. Temperature variations lead to changes in resist sensitivity, and thus to variations in critical dimensions. This problem is especially important in maskmaking, where the substrate is of poor heat conductivity, as well as in direct write EBL, where the writing speed is extremely high.
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SCATT is a software tool used to simulate light scattering on microelectronic patterns. The software is based on the rigorous coupled wave analysis (RCWA) physical model.The software is equipment-independent and utilizes a user friendly 3D graphical user interface. [more...] |
 XeDraw and XPG-2 are both pattern generators; they convert any SEM into a lithography system. Attached to a conventional SEM, focused ion-beam, or dual beam tool, they upgrade the system to perform nanolithography or MEMS fabrication. A beam blanker and a precision stage are also available that can be installed into the SEM without taking apart the column.
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Fiber photonicsA high-quality photonics integrated into an optical fiber as a low-cost and easy-to-use solution for wavefront manipulation. Specific designs are optical elements on the fiber such as beam shapers, focusing lenses, and vortex faceplate. Designs and manufacturing of fiber optics up to customer?s specification is available; the technology was transferred to HighRI Optics, Inc., please send inquiries to them. [more...] |